Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging

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Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging


Li, Bowen; Endo, Akira; O'Gorman, Colm; Otsuka, Takamitsu; Cummins, T. (Thomas); Donnelly, Tony; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry; Jiang, Weihua; Higashiguchi, Takeshi; Yugami, Noboru
Permanent link: http://hdl.handle.net/10197/3566
Date: 2011-08-22
Recommended citation:
Li, Bowen, Endo, Akira, O'Gorman, Colm, Otsuka, Takamitsu, Cummins, T. (Thomas), Donnelly, Tony, Kilbane, Deirdre, Dunne, Padraig, O'Sullivan, Gerry, Jiang, Weihua, Higashiguchi, Takeshi, Yugami, Noboru : Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging. Presented at a poster session at Advances in X-Ray/EUV Optics and Components VI, Monday 22 August 2011, San Diego, California, USA. 2011-08-22.
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Abstract:

An engineering prototype high average power 13.5-nm source has been shipped to semiconductor facilities to permit the commencement of high volume production at a 100 W power level in 2011. In this source, UTA (unresolved transition array) emission of highly ionized Sn is optimized for high conversion efficiency and full recovery of the injected fuel is realized through ion deflection in a magnetic field. By use of a low-density target, satellite emission is suppressed and full ionization attained with short pulse CO2 laser irradiation. The UTA is scalable to shorter wavelengths, and Gd is shown to have similar conversion efficiency to Sn (13.5 nm) at a higher plasma temperature, with a narrow spectrum centered at 6.7 nm, where a 70% reflectivity mirror is anticipated. Optimization of short pulse CO2 laser irradiation is studied, and further extension of the same method is discussed, to realize 100 W average power down to a wavelength of 3 nm

Author: Li, Bowen; Endo, Akira; O'Gorman, Colm; Otsuka, Takamitsu; Cummins, T. (Thomas); Donnelly, Tony; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry; Jiang, Weihua; Higashiguchi, Takeshi; Yugami, Noboru
Funding Details: Science Foundation Ireland
Conference Details: Presented at a poster session at Advances in X-Ray/EUV Optics and Components VI, Monday 22 August 2011, San Diego, California, USA
Type of material: Conference Publication
Publisher: Society of Photo-optical Instrumentation Engineers
Copyright (published version): 2011 SPIE
Rights statement: One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Is part of: Proceedings of the SPIE, Volume 8139 Advances in X-Ray/EUV Optics and Components VI, San Diego, California, 22nd August 2011
DOI: 10.1117/12.892513
Keywords: Extreme ultraviolet; Water window; Unresolved transition array; Rare-earth; LLP
Library of Congress Subject Headings: Ultraviolet radiation; Lithography; Laser plasmas; Rare earths
Other web versions: Publisher's version; http://dx.doi.org/10.1117/12.892513;
Status of item: Not peer reviewed
Language: en
Availability: Full text available
Available: 2012-04-17T11:06:31Z

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