Material kinetics during fabrication of holographic gratings in acrylamide-based photopolymer

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Show simple item record Close, Ciara E. Kelly, John V. Gleeson, M. R. O'Neill, Feidhlim T. Sheridan, John T. 2012-02-02T16:43:42Z 2012-02-02T16:43:42Z 2005 Optical Society of America en 2005-10-16
dc.description Paper presented at Frontiers in Optics (FiO), Tucson, Arizona, October 16, 2005 en
dc.description.abstract We describe holographic grating formation in Acrylamide-based photopolymer material using the NonLocal Diffusion Driven model & discuss radical suppression leading to an inhibition period before grating growth. Diffusion effects of monomer & polymer are discussed. en
dc.description.sponsorship Not applicable en
dc.format.extent 40493 bytes
dc.format.extent 1072 bytes
dc.format.mimetype application/pdf
dc.format.mimetype text/plain
dc.language.iso en en
dc.publisher Optical Society of America en
dc.relation.ispartof Frontiers in Optics, OSA Technical Digest Series en
dc.rights This paper was published in Frontiers in Optics and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law. en
dc.subject Holographic en
dc.subject Optical data processing en
dc.subject.lcsh Diffraction gratings en
dc.subject.lcsh Photopolymers en
dc.subject.lcsh Holographic storage devices (Computer science) en
dc.title Material kinetics during fabrication of holographic gratings in acrylamide-based photopolymer en
dc.type Conference Publication en
dc.internal.availability Full text available en
dc.internal.webversions en
dc.status Not peer reviewed en
dc.neeo.contributor Close|Ciara E.|aut| en
dc.neeo.contributor Kelly|John V.|aut| en
dc.neeo.contributor Gleeson|M. R.|aut| en
dc.neeo.contributor O'Neill|Feidhlim T.|aut| en
dc.neeo.contributor Sheridan|John T.|aut| en
dc.description.admin au, ti, la, sp, ke, ab - kpw17/11/11 en

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