Adjusted intensity nonlocal diffusion model of photopolymer grating formation

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dc.contributor.author Lawrence, Justin R.
dc.contributor.author O'Neill, Feidhlim T.
dc.contributor.author Sheridan, John T.
dc.date.accessioned 2012-01-30T14:57:42Z
dc.date.available 2012-01-30T14:57:42Z
dc.date.copyright 2002 Optical Society of America en
dc.date.issued 2002-04-01
dc.identifier.citation Journal of the Optical Society of America B en
dc.identifier.issn 0740-3224
dc.identifier.issn 1520-8540
dc.identifier.uri http://hdl.handle.net/10197/3459
dc.description.abstract Diffusion-based models of grating formation in photopolymers have been proposed in which the rate of monomer polymerization (removal) is directly proportional to the illuminating intensity inside the medium. However, based on photochemical considerations, the rate of polymerization is proportional in the steady state to the square root of the interference intensity. Recently it was shown that, by introducing a nonlocal response function into the one-dimensional diffusion equation that governs holographic grating formation in photopolymers, one can deduce both high-frequency and low-frequency cutoffs in the spatial-frequency response of photopolymer materials. Here the first-order nonlocal coupled diffusion equations are derived for the case of a general relationship between the rate of polymerization and the exposing intensity. Assuming a twoharmonic monomer expansion, the resultant analytic solutions are then used to fit experimental growth curves for gratings fabricated with different spatial frequencies. Various material parameters, including monomer diffusion constant D and nonlocal variance s, are estimated. en
dc.description.sponsorship Not applicable en
dc.format.extent 334977 bytes
dc.format.extent 1072 bytes
dc.format.mimetype application/pdf
dc.format.mimetype text/plain
dc.language.iso en en
dc.publisher Optical Society of America en
dc.rights This paper was published in Journal of the Optical Society of America B and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/abstract.cfm?URI=josab-19-4-621. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law. en
dc.subject.lcsh Diffraction gratings en
dc.subject.lcsh Holographic storage devices (Computer science) en
dc.subject.lcsh Photopolymers en
dc.title Adjusted intensity nonlocal diffusion model of photopolymer grating formation en
dc.type Journal Article en
dc.internal.availability Full text available en
dc.internal.webversions Publisher's version en
dc.internal.webversions http://dx.doi.org/10.1364/JOSAB.19.000621 en
dc.status Not peer reviewed en
dc.identifier.volume 19 en
dc.identifier.issue 4 en
dc.identifier.startpage 621 en
dc.identifier.endpage 629 en
dc.identifier.doi 10.1364/JOSAB.19.000621
dc.neeo.contributor Lawrence|Justin R.|aut| en
dc.neeo.contributor O'Neill|Feidhlim T.|aut| en
dc.neeo.contributor Sheridan|John T.|aut| en
dc.description.admin pe, la, sp, ke, ab, is, en - kpw8/11/11 en


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