| dc.contributor.author | Gleeson, M. R. | |
| dc.contributor.author | Liu, Shui | |
| dc.contributor.author | McLeod, Robert R. | |
| dc.contributor.author | Sheridan, John T. | |
| dc.date.accessioned | 2012-01-05T16:52:00Z | |
| dc.date.available | 2012-01-05T16:52:00Z | |
| dc.date.copyright | 2009 Optical Society of America | en |
| dc.date.issued | 2009-08-19 | |
| dc.identifier.citation | Journal of the Optical Society of America B | en |
| dc.identifier.issn | 0740-3224 | |
| dc.identifier.issn | 1520-8540 | |
| dc.identifier.uri | http://hdl.handle.net/10197/3424 | |
| dc.description.abstract | In the first of this series of papers [J. Opt. Soc. Am. B 26, 1736 (2009)], a new kinetic model, which includes most of the major photochemical and nonlocal photopolymerization driven diffusion effects, was proposed. Predictions made using the model were presented, and the numerical convergence of these simulations were examined when retaining higher-concentration harmonics. The validity and generality of the model is examined by applying it to fit experimental data for two different types of photopolymer material appearing in the literature. The first of these photopolymer materials involves an acrylamide monomer in a polyvinylalcohol matrix. The second is a more complex photopolymer in an epoxy resin matrix. Using the new model, key material parameters are extracted by numerically fitting experimentally obtained diffraction efficiency growth curves. The growth curves used include data captured both during exposure and post-exposure, allowing examination and analysis of "dark reactions". | en |
| dc.description.sponsorship | Science Foundation Ireland | en |
| dc.description.sponsorship | Irish Research Council for Science, Engineering and Technology | en |
| dc.format.extent | 312814 bytes | |
| dc.format.extent | 1072 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | text/plain | |
| dc.language.iso | en | en |
| dc.publisher | Optical Society of America | en |
| dc.rights | This paper was published in Journal of the Optical Society of America B and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/abstract.cfm?URI=josab-26-9-1746. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law. | en |
| dc.subject.lcsh | Photopolymerization | en |
| dc.subject.lcsh | Diffraction gratings | en |
| dc.subject.lcsh | Holographic storage devices (Computer science) | en |
| dc.subject.lcsh | Photopolymers | en |
| dc.title | Nonlocal photopolymerization kinetics including multiple termination mechanisms and dark reactions. Part II. Experimental validation | en |
| dc.type | Journal Article | en |
| dc.internal.availability | Full text available | en |
| dc.internal.webversions | Publisher's version | en |
| dc.internal.webversions | http://dx.doi.org/10.1364/JOSAB.26.001746 | en |
| dc.status | Not peer reviewed | en |
| dc.identifier.volume | 26 | en |
| dc.identifier.issue | 9 | en |
| dc.identifier.startpage | 1746 | en |
| dc.identifier.endpage | 1754 | en |
| dc.identifier.doi | 10.1364/JOSAB.26.001746 | |
| dc.neeo.contributor | Gleeson|M. R.|aut| | en |
| dc.neeo.contributor | Liu|Shui|aut| | en |
| dc.neeo.contributor | McLeod|Robert R.|aut| | en |
| dc.neeo.contributor | Sheridan|John T.|aut| | en |
| dc.description.othersponsorship | Enterprise Ireland | en |
| dc.description.admin | pe, la, sp, ke, ab, is, en - kpw17/11/11 | en |
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