| dc.contributor.author | Liu, Shui | |
| dc.contributor.author | Gleeson, M. R. | |
| dc.contributor.author | Sabol, Dušan | |
| dc.contributor.author | Sheridan, John T. | |
| dc.date.accessioned | 2011-12-20T15:24:03Z | |
| dc.date.available | 2011-12-20T15:24:03Z | |
| dc.date.copyright | 2009 American Institute of Physics | en |
| dc.date.issued | 2009-11 | |
| dc.identifier.citation | Journal of Applied Physics | en |
| dc.identifier.issn | 00218979 | |
| dc.identifier.uri | http://hdl.handle.net/10197/3414 | |
| dc.description.abstract | In order to further improve photopolymer materials for applications such as data storage, a deeper understanding of the photochemical mechanisms which are present during the formation of holographic gratings has become ever more crucial. This is especially true of the photoinitiation processes, since holographic data storage requires multiple sequential short exposures. Previously, models describing the temporal variation in the photosensitizer (dye)concentration as a function of exposure have been presented and applied to two different types of photosensitizer, i.e., Methylene Blue and Erythrosine B, in a polyvinyl alcohol/acrylamide based photopolymer. These models include the effects of photosensitizer recovery and bleaching under certain limiting conditions. In this paper, based on a detailed study of the photochemical reactions, the previous models are further developed to more physically represent these effects. This enables a more accurate description of the time varying dye absorption, recovery, and bleaching, and therefore of the generation of primary radicals in photopolymers containing such dyes. | en |
| dc.description.sponsorship | Science Foundation Ireland | en |
| dc.description.sponsorship | Irish Research Council for Science, Engineering and Technology | en |
| dc.description.sponsorship | Other funder | en |
| dc.format.extent | 416961 bytes | |
| dc.format.extent | 1072 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | text/plain | |
| dc.language.iso | en | en |
| dc.publisher | American Institute of Physics | en |
| dc.rights | The following article appeared in Journal of Applied Physics, 106 : 104911 and may be found at http://link.aip.org/link/doi/10.1063/1.3262586. It article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. | en |
| dc.subject.lcsh | Photochemistry | en |
| dc.subject.lcsh | Photopolymers | en |
| dc.subject.lcsh | Holographic storage devices (Computer science) | en |
| dc.subject.lcsh | Photosensitizing compounds | en |
| dc.title | Extended model of the photoinitiation mechanisms in photopolymer materials | en |
| dc.type | Journal Article | en |
| dc.internal.availability | Full text available | en |
| dc.internal.webversions | Publisher's version | en |
| dc.internal.webversions | http://dx.doi.org/10.1063/1.3262586 | en |
| dc.status | Not peer reviewed | en |
| dc.identifier.volume | 106 | en |
| dc.identifier.issue | 10 | en |
| dc.identifier.startpage | 104911-1 | en |
| dc.identifier.endpage | 104911-10 | en |
| dc.identifier.doi | 10.1063/1.3262586 | |
| dc.neeo.contributor | Liu|Shui|aut| | en |
| dc.neeo.contributor | Gleeson|M. R.|aut| | en |
| dc.neeo.contributor | Sabol|Dušan|aut| | en |
| dc.neeo.contributor | Sheridan|John T.|aut| | en |
| dc.description.othersponsorship | Enterprise Ireland | en |
| dc.description.admin | pe, la, sp, ke, is, en - TS 06.12.11 | en |
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