Extended model of the photoinitiation mechanisms in photopolymer materials

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dc.contributor.author Liu, Shui
dc.contributor.author Gleeson, M. R.
dc.contributor.author Sabol, Dušan
dc.contributor.author Sheridan, John T.
dc.date.accessioned 2011-12-20T15:24:03Z
dc.date.available 2011-12-20T15:24:03Z
dc.date.copyright 2009 American Institute of Physics en
dc.date.issued 2009-11
dc.identifier.citation Journal of Applied Physics en
dc.identifier.issn 00218979
dc.identifier.uri http://hdl.handle.net/10197/3414
dc.description.abstract In order to further improve photopolymer materials for applications such as data storage, a deeper understanding of the photochemical mechanisms which are present during the formation of holographic gratings has become ever more crucial. This is especially true of the photoinitiation processes, since holographic data storage requires multiple sequential short exposures. Previously, models describing the temporal variation in the photosensitizer (dye)concentration as a function of exposure have been presented and applied to two different types of photosensitizer, i.e., Methylene Blue and Erythrosine B, in a polyvinyl alcohol/acrylamide based photopolymer. These models include the effects of photosensitizer recovery and bleaching under certain limiting conditions. In this paper, based on a detailed study of the photochemical reactions, the previous models are further developed to more physically represent these effects. This enables a more accurate description of the time varying dye absorption, recovery, and bleaching, and therefore of the generation of primary radicals in photopolymers containing such dyes. en
dc.description.sponsorship Science Foundation Ireland en
dc.description.sponsorship Irish Research Council for Science, Engineering and Technology en
dc.description.sponsorship Other funder en
dc.format.extent 416961 bytes
dc.format.extent 1072 bytes
dc.format.mimetype application/pdf
dc.format.mimetype text/plain
dc.language.iso en en
dc.publisher American Institute of Physics en
dc.rights The following article appeared in Journal of Applied Physics, 106 : 104911 and may be found at http://link.aip.org/link/doi/10.1063/1.3262586. It article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. en
dc.subject.lcsh Photochemistry en
dc.subject.lcsh Photopolymers en
dc.subject.lcsh Holographic storage devices (Computer science) en
dc.subject.lcsh Photosensitizing compounds en
dc.title Extended model of the photoinitiation mechanisms in photopolymer materials en
dc.type Journal Article en
dc.internal.availability Full text available en
dc.internal.webversions http://dx.doi.org/10.1063/1.3262586 en
dc.status Not peer reviewed en
dc.identifier.volume 106 en
dc.identifier.issue 10 en
dc.identifier.startpage 104911-1 en
dc.identifier.endpage 104911-10 en
dc.identifier.doi 10.1063/1.3262586
dc.neeo.contributor Liu|Shui|aut| en
dc.neeo.contributor Gleeson|M. R.|aut| en
dc.neeo.contributor Sabol|Dušan|aut| en
dc.neeo.contributor Sheridan|John T.|aut| en
dc.description.othersponsorship Enterprise Ireland en
dc.description.admin pe, la, sp, ke, is, en - TS 06.12.11 en

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