Conversion of amorphous TiO2 coatings into their crystalline form using a novel microwave plasma treatment

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dc.contributor.author Dang, Binh H.Q.
dc.contributor.author Rahman, Mahfujur
dc.contributor.author MacElroy, J. M. Don
dc.contributor.author Dowling, Denis P.
dc.date.accessioned 2011-04-15T09:06:38Z
dc.date.available 2011-04-15T09:06:38Z
dc.date.copyright 2010 Published by Elsevier B.V. en
dc.date.issued 2011-07-25
dc.identifier.citation Surface and Coatings Technology en
dc.identifier.issn 0257-8972
dc.identifier.uri http://hdl.handle.net/10197/2896
dc.description.abstract Crystalline titanium dioxide (TiO2) coatings have been widely used in photo-electrochemical solar cell applications. In this study, TiO2 and carbon-doped TiO2 coatings were deposited onto unheated titanium and silicon wafer substrates using a DC closed-field magnetron sputtering system. The resultant coatings had an amorphous structure and a post-deposition heat treatment is required to convert this amorphous structure into the photoactive crystalline phase(s) of TiO2. This study investigates the use of a microwave plasma heat treatment as a means of achieving this crystalline conversion. The treatment involved placing the sputtered coatings into a 2.45 GHz microwave-induced nitrogen plasma where they were heated to approximately 550°C. It was observed that for treatment times as short as 1 minute, the 0.25-µm thick coatings were converted into the anatase crystalline phase of TiO2. The coatings were further transformed into the rutile crystalline phase after treatments at higher temperatures. The doping of TiO2 with carbon was found to result in a reduction in this phase transformation temperature, with higher level of doping (up to 5.8% in this study) leading to lower anatase-to-rutile transition temperature. The photoactivity performance of both doped and un-doped coatings heat-treated using both furnace and microwave plasma was compared. The carbon-doped TiO2 exhibited a 29% increase in photocurrent density compared to that observed for the un-doped coating. Comparing carbon-doped coatings heat-treated using the furnace and microwave plasma, it was observed that the latter yielded a 19% increase in photocurrent density. This enhanced performance may be correlated to the differences in the coatings’ surface morphology and band gap energy, both of which influence the coatings’ photoabsorption efficiency. en
dc.description.sponsorship Science Foundation Ireland en
dc.format.extent 933187 bytes
dc.format.mimetype application/pdf
dc.language.iso en en
dc.publisher Elsevier en
dc.relation.requires Chemical and Bioprocess Engineering Research Collection en
dc.relation.requires Electrical, Electronic & Mechanical Engineering Research Collection en
dc.subject Titanium dioxide en
dc.subject Magnetron sputtering en
dc.subject Carbon doping en
dc.subject Microwave plasma en
dc.subject Phase transformation en
dc.subject.lcsh Titanium dioxide films en
dc.subject.lcsh Magnetrons en
dc.subject.lcsh Sputtering (Physics) en
dc.subject.lcsh Microwave plasmas en
dc.subject.lcsh Phase transformations (Statistical physics) en
dc.title Conversion of amorphous TiO2 coatings into their crystalline form using a novel microwave plasma treatment en
dc.type Journal Article en
dc.internal.availability Full text available en
dc.internal.webversions Publisher's version en
dc.internal.webversions http://dx.doi.org/10.1016/j.surfcoat.2011.03.075 en
dc.status Peer reviewed en
dc.identifier.volume 205 en
dc.identifier.issue Supplement 2 en
dc.identifier.startpage S235 en
dc.identifier.endpage S240 en
dc.citation.other PSE 2010 Special Issue, Proceedings of the 12th International Conference on Plasma Surface Engineering en
dc.identifier.doi 10.1016/j.surfcoat.2011.03.075
dc.neeo.contributor Dang|Binh H.Q.|aut| en
dc.neeo.contributor Rahman|Mahfujur|aut| en
dc.neeo.contributor MacElroy|J. M. Don|aut| en
dc.neeo.contributor Dowling|Denis P.|aut| en


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