Simplified 1-D calculation of 13.5-nm emission in a tin plasma including radiation transport

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dc.contributor.author White, John Kingston
dc.contributor.author Dunne, Padraig
dc.contributor.author Hayden, Patrick
dc.contributor.author O'Sullivan, Gerry
dc.date.accessioned 2011-01-14T17:18:42Z
dc.date.available 2011-01-14T17:18:42Z
dc.date.copyright 2009 American Institute of Physics en
dc.date.issued 2009-12-04
dc.identifier.citation Journal of Applied Physics en
dc.identifier.uri http://hdl.handle.net/10197/2725
dc.description.abstract Many next generation lithography schemes for the semiconductor industry are based on a 13.5-nm tin plasma light source, where hundreds of thousands of 4d-4f, 4p-4d, and 4d-5p transitions from Sn5+–Sn13+ ions overlap to form an unresolved transition array. To aid computation, transition arrays are treated statistically, and Hartree-Fock results are used to calculate radiation transport in the optically thick regime with a 1-D Lagrangian plasma hydrodynamics code. Time-dependent spectra and conversion efficiencies of 2% in-band 13.5-nm emission to laser energy are predicted for a Nd:YAG laser incident on a pure tin slab target as a function of laser power density and pulse duration at normal incidence. Calculated results showed a maximum conversion efficiency of 2.3% for a 10-ns pulse duration at 8.0 x 1010 W/cm2 and are compared to experimental data where available. Evidence for the need to include lateral expansion is presented. en
dc.description.sponsorship Science Foundation Ireland en
dc.format.extent 386419 bytes
dc.format.mimetype application/pdf
dc.language.iso en en
dc.publisher American Institute of Physics en
dc.subject HF calculations en
dc.subject Plasma light propagation en
dc.subject Plasma production by laser, en
dc.subject Plasma simulation en
dc.subject.lcsh Hartree-Fock approximation en
dc.subject.lcsh Laser plasmas en
dc.subject.lcsh Semiconductor industry--Laser use in en
dc.subject.lcsh Extreme ultraviolet lithography en
dc.title Simplified 1-D calculation of 13.5-nm emission in a tin plasma including radiation transport en
dc.type Journal Article en
dc.internal.availability Full text available en
dc.internal.webversions Publisher's version en
dc.internal.webversions http://dx.doi.org/10.1063/1.3264692 en
dc.status Peer reviewed en
dc.identifier.volume 106 en
dc.identifier.issue 11 en
dc.identifier.startpage 113303-1 en
dc.identifier.endpage 113303-8 en
dc.identifier.doi 10.1063/1.3264692
dc.neeo.contributor White|John Kingston|aut| en
dc.neeo.contributor Dunne|Padraig|aut| en
dc.neeo.contributor Hayden|Patrick|aut| en
dc.neeo.contributor O'Sullivan|Gerry|aut| en


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