We report results from a combined optical interferometric and spectrally resolved imaging study on colliding laser produced aluminium plasmas. A Nomarski interferometer was used to probe the spatio-temporal distribution ...
Many next generation lithography schemes for the semiconductor industry are based on a 13.5-nm tin plasma light source, where hundreds of thousands of 4d-4f, 4p-4d, and 4d-5p transitions from Sn5+–Sn13+ ions overlap to ...