Browsing by Subject "Extreme ultraviolet lithography"

DSpace/Manakin Repository

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Robust liquid metal collector mirror for EUV and soft X-ray plasma sources

Fahy, Kenneth ; O'Reilly, Fergal ; Scally, Enda ; Sheridan, Paul (SPIE, 2010-08-02)

Recent work in UCD has centred on the development of a liquid metal coating process for EUV and soft X-ray collector optics. The work involves using a room temperature liquid metal coated on a solid metal substrate of the ...
Simplified 1-D calculation of 13.5-nm emission in a tin plasma including radiation transport

White, John Kingston ; Dunne, Padraig ; Hayden, Patrick ; O'Sullivan, Gerry (American Institute of Physics, 2009-12-04)

Many next generation lithography schemes for the semiconductor industry are based on a 13.5-nm tin plasma light source, where hundreds of thousands of 4d-4f, 4p-4d, and 4d-5p transitions from Sn5+–Sn13+ ions overlap to ...
UTA versus line emission for EUVL : studies on xenon emission at the NIST EBIT

Fahy, Kenneth ; Dunne, Padraig ; McKinney, Luke ; O'Sullivan, Gerry ; Sokell, Emma ; White, John K. ; Aguilar, A. ; Pomeroy, J.M. ; Tan, J.N. ; Blagojevi, B. ; LeBigot, E.-O. ; Gillaspy, J.D. (IOP Publishing, 2004-12)

Spectra from xenon ions have been recorded at the NIST EBIT and the emission into a 2% bandwidth at 13.5 nm arising from 4d_5p transitions compared with that from 4d_4f and 4p_4d transitions in Xe XI and also with that ...