Browsing by Subject "Semiconductor industry--Laser use in"

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Simplified 1-D calculation of 13.5-nm emission in a tin plasma including radiation transport

White, John Kingston ; Dunne, Padraig ; Hayden, Patrick ; O'Sullivan, Gerry (American Institute of Physics, 2009-12-04)

Many next generation lithography schemes for the semiconductor industry are based on a 13.5-nm tin plasma light source, where hundreds of thousands of 4d-4f, 4p-4d, and 4d-5p transitions from Sn5+–Sn13+ ions overlap to ...