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Browsing by Subject "Lithography"
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(American Institute of Physics, 2011-12-05)Plasmas containing gadolinium have been proposed as sources for next generation lithography at 6.x nm. To determine the optimum plasma conditions, atomic structure calculations have been performed for Gd11+ to Gd27+ ions ...
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Photoreduction of SERS-active metallic nanostructures on chemically-patterned ferroelectric crystals (ACS Publications, 2012-08-28)Photodeposition of metallic nanostructures onto ferroelectric surfaces is typically based on patterning local surface reactivity via electric field poling. Here, we demonstrate metal deposition onto substrates which have ...
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(Society of Photo-optical Instrumentation Engineers, 2011-08-22)An engineering prototype high average power 13.5-nm source has been shipped to semiconductor facilities to permit the commencement of high volume production at a 100 W power level in 2011. In this source, UTA (unresolved ...
Now showing items 1-3 of 3